Obtaining low resistivity (∼100  μ...

Obtaining low resistivity (∼100  μ Ω cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor

Krylov, Igor, Zoubenko, Ekaterina, Weinfeld, Kamira, Kauffmann, Yaron, Xu, Xianbin, Ritter, Dan, Eizenberg, Moshe
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Volume:
36
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5035422
Date:
September, 2018
File:
PDF, 4.16 MB
english, 2018
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