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Analysis of SiO2 Thin Films Deposited by PECVD Using an Oxygen-TEOS-Argon Mixture
Viana, Carlos E., Silva, Ana N. R. da, Morimoto, Nilton I., Bonnaud, OlivierVolume:
31
Language:
english
Journal:
Brazilian Journal of Physics
DOI:
10.1590/s0103-97332001000200023
Date:
June, 2001
File:
PDF, 208 KB
english, 2001