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[IEEE 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2018.4.30-2018.5.3)] 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - CD-TEM: Characterizing impact of TEM sample preparation on CD metrology
Kenslea, Anne, Hakala, Chris, Zhong, Zhenxin, Lu, Yinggang, Fretwell, John, Hager, Jack, Kang, Chris, Tan, Haiyan, Weng, Weihao, Dumas, Laurent, Brooks, IreneYear:
2018
Language:
english
DOI:
10.1109/ASMC.2018.8373170
File:
PDF, 579 KB
english, 2018