Influence of partial charge on the material removal rate during chemical polishing
Suratwala, T., Steele, R., Miller, P.E., Wong, L., Destino, J. F., Feigenbaum, E., Shen, N., Feit, M.Language:
english
Journal:
Journal of the American Ceramic Society
DOI:
10.1111/jace.15995
Date:
August, 2018
File:
PDF, 1.18 MB
english, 2018