Selective atomic layer deposition of MoSix on Si (001) in...

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Applied Surface Science 2018 / 8

Selective atomic layer deposition of MoSix on Si (001) in preference to Silicon Nitride and Silicon Oxide

Youn Choi, Jong, Ahles, Christopher F., Hung, Raymond, Kim, Namsung, Kummel, Andrew C.
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Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2018.08.072
Date:
August, 2018
File:
PDF, 1.91 MB
english, 2018
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