[IEEE 2018 IEEE International Interconnect Technology Conference (IITC) - Santa Clara, CA, USA (2018.6.4-2018.6.7)] 2018 IEEE International Interconnect Technology Conference (IITC) - Interconnect Stack using Self-Aligned Quad and Double Patterning for 10nm High Volume Manufacturing
Yeoh, A., Madhavan, A., Kybert, N., Anand, S., Shin, J., Asoro, M., Samarajeewa, S., Steigerwald, J., Ganpule, C., Buehler, M., Tripathi, A., Souw, V., Haran, M., Nigam, S., Chikarmane, V., Yashar, P.Year:
2018
Language:
english
DOI:
10.1109/IITC.2018.8430489
File:
PDF, 1.36 MB
english, 2018