Amplitude versus phase effects in extreme ultraviolet...

Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging

Naulleau, Patrick P., Benk, Markus, Goldberg, Kenneth A., Gullikson, Eric M., Wojdyla, Antoine, Wang, Yow-Gwo, Neureuther, Andy
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Volume:
56
Language:
english
Journal:
Applied Optics
DOI:
10.1364/ao.56.003325
Date:
April, 2017
File:
PDF, 621 KB
english, 2017
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