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Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging
Naulleau, Patrick P., Benk, Markus, Goldberg, Kenneth A., Gullikson, Eric M., Wojdyla, Antoine, Wang, Yow-Gwo, Neureuther, AndyVolume:
56
Language:
english
Journal:
Applied Optics
DOI:
10.1364/ao.56.003325
Date:
April, 2017
File:
PDF, 621 KB
english, 2017