[IEEE 2018 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu (2018.4.16-2018.4.19)] 2018 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Approaches and opportunities for area-selective atomic layer deposition
Mackus, Adriaan J.M.Year:
2018
Language:
english
DOI:
10.1109/VLSI-TSA.2018.8403864
File:
PDF, 128 KB
english, 2018