Influence of substrate annealing on inducing Ti3+ and...

  • Main
  • 2018 / 8
  • Influence of substrate annealing on inducing Ti3+ and...
Applied Surface Science 2018 / 8

Influence of substrate annealing on inducing Ti3+ and oxygen vacancy in TiO2 thin films deposited via RF magnetron sputtering

Abdullah, S.A., Sahdan, M.Z., Nafarizal, N., Saim, H., Embong, Z., Cik Rohaida, C.H., Adriyanto, F.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2018.08.137
Date:
August, 2018
File:
PDF, 1.81 MB
english, 2018
Conversion to is in progress
Conversion to is failed