Chemical Vapour Deposition of ZrN using in situ produced ZrCl4 as a precursor (CH-4:L04)
Rauchenwald, Elisabeth, Lessiak, Mario, Weissenbacher, Ronald, Haubner, RolandLanguage:
english
Journal:
Ceramics International
DOI:
10.1016/j.ceramint.2018.08.191
Date:
August, 2018
File:
PDF, 1.29 MB
english, 2018