Facile morphology control of high aspect ratio patterned Si nanowires by metal-assisted chemical etching
Bagal, Indrajit V., Johar, Muhammad Ali, Hassan, Afifi Mostafa, Waseem, Aadil, Ryu, Sang-WanLanguage:
english
Journal:
Journal of Materials Science: Materials in Electronics
DOI:
10.1007/s10854-018-9929-8
Date:
August, 2018
File:
PDF, 3.60 MB
english, 2018