Reconsideration of Si pillar thermal oxidation mechanism
Kageshima, Hiroyuki, Shiraishi, Kenji, Endoh, TetsuoVolume:
57
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.57.06KD02
Date:
June, 2018
File:
PDF, 1.39 MB
english, 2018