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Effects of hydrogen annealing temperature on the resistive switching characteristics of HfOx thin films
Jung, Yong Chan, Seong, Sejong, Lee, Taehoon, Kim, Seon Yong, Park, In-Sung, Ahn, JinhoVolume:
88
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2018.08.013
Date:
December, 2018
File:
PDF, 2.19 MB
english, 2018