Investigation for the structural stress of SiO 2 thin films and its distribution on the large-wafer created by plasma enhanced chemical vapor deposition
Sun, DeGui, Sun, Qingyu, Xing, Wenchao, Sun, Zheyu, Shang, Hongpeng, Chang, Liyuan, Wang, Xueping, Liu, Peng, Hall, TrevorVolume:
8
Language:
english
Journal:
AIP Advances
DOI:
10.1063/1.5045516
Date:
August, 2018
File:
PDF, 2.61 MB
english, 2018