[IEEE 2018 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2018.4.16-2018.4.19)] 2018 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - A new and simple DC method for thermal-resistance extraction of scaled FinFET devices
Huang, Wei-Cheng, Su, PinYear:
2018
Language:
english
DOI:
10.1109/VLSI-TSA.2018.8403832
File:
PDF, 271 KB
english, 2018