Improved distribution of resistance switching through...

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IEEE Journal of the Electron Devices Society 2018

Improved distribution of resistance switching through localized Ti-doped NiO layer with InZnOx/CuOx oxide diode

Song, Minho, Lee, Hyunki, Seo, David H., Lee, Hyeon-Jun, Kim, June-Seo, Cho, Hui-Sup, Lyu, Hong-Kun, Seo, Sunae, Lee, Myoung-Jae
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Year:
2018
Language:
english
Journal:
IEEE Journal of the Electron Devices Society
DOI:
10.1109/jeds.2018.2864180
File:
PDF, 847 KB
english, 2018
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