Physical stability against hydrogen plasma for ZnInSnO thin...

Japanese Journal of Applied Physics 2016 / 12 Vol. 55; Iss. 12

Physical stability against hydrogen plasma for ZnInSnO thin films deposited by combinatorial RF magnetron sputtering

Kim, Eun Mi, Oh, Jeung-Pyo, Ha, Tae-Won, Kim, Young-Baek, Kim, Tae-Won, Heo, Gi-Seok
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Volume:
55
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.55.125801
Date:
December, 2016
File:
PDF, 2.10 MB
english, 2016
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