Atomic Layer Deposition of Cobalt Using H 2...

The Journal of Physical Chemistry C 2018 / 09

Atomic Layer Deposition of Cobalt Using H 2 -, N 2 - and NH 3 -Based Plasmas: On the Role of the Co-Reactant

Vos, Martijn F.J., van Straaten, Gerben, Kessels, Wilhelmus M.M., Mackus, Adriaan J.M.
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Language:
english
Journal:
The Journal of Physical Chemistry C
DOI:
10.1021/acs.jpcc.8b06342
Date:
September, 2018
File:
PDF, 12.81 MB
english, 2018
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