Pure hydrogen low-temperature plasma exposure of HOPG and...

Beilstein Journal of Nanotechnology 2012 / 12 Vol. 3

Pure hydrogen low-temperature plasma exposure of HOPG and graphene: Graphane formation?

Eren, Baran, Hug, Dorothée, Marot, Laurent, Pawlak, Rémy, Kisiel, Marcin, Steiner, Roland, Zumbühl, Dominik M, Meyer, Ernst
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Volume:
3
Language:
english
Journal:
Beilstein Journal of Nanotechnology
DOI:
10.3762/bjnano.3.96
Date:
December, 2012
File:
PDF, 7.02 MB
english, 2012
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