Fabrication of ferroelectric Fe doped HfO 2 epitaxial thin films by ion-beam sputtering method and their characterization
Shiraishi, Takahisa, Choi, Sujin, Kiguchi, Takanori, Shimizu, Takao, Uchida, Hiroshi, Funakubo, Hiroshi, Konno, Toyohiko J.Volume:
57
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.57.11UF02
Date:
November, 2018
File:
PDF, 1.19 MB
english, 2018