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Rapid Improvement in Thin Film Transistors with Atomic-Layer-Deposited InOx Channels via O2 Plasma Treatment
Ma, Qian, Shao, Yan, Wang, Y.-P., Zheng, H.-M., Zhu, B., Liu, W.-J., Ding, Shi-Jin, Zhang, D. W.Year:
2018
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/LED.2018.2869019
File:
PDF, 660 KB
english, 2018