Ground state of ultrashallow thermal donors in silicon

Japanese Journal of Applied Physics 2018 / 10 Vol. 57; Iss. 10

Ground state of ultrashallow thermal donors in silicon

Hara, Akito, Awano, Teruyoshi
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Volume:
57
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.57.101301
Date:
October, 2018
File:
PDF, 1.68 MB
english, 2018
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