Inline PECVD Deposition of Poly-Si-Based Tunnel Oxide Passivating Contacts
Temmler, Jan, Polzin, Jana-Isabelle, Feldmann, Frank, Kraus, Leonard, Kafle, Bishal, Mack, Sebastian, Moldovan, Anamaria, Hermle, Martin, Rentsch, JochenLanguage:
english
Journal:
physica status solidi (a)
DOI:
10.1002/pssa.201800449
Date:
September, 2018
File:
PDF, 548 KB
english, 2018