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Thermal Atomic Layer Etching of Copper by Sequential Steps Involving Oxidation and Exposure to Hexafluoroacetylacetone
Mohimi, Elham, Chu, Xiaoqing I., Trinh, Brian B., Babar, Shaista, Girolami, Gregory S., Abelson, John R.Volume:
7
Year:
2018
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0211809jss
File:
PDF, 460 KB
english, 2018