[IEEE 2018 IEEE International Interconnect Technology Conference (IITC) - Santa Clara, CA (2018.6.4-2018.6.7)] 2018 IEEE International Interconnect Technology Conference (IITC) - Subtractive Etch of Ruthenium for Sub-5nm Interconnect
Wan, Danny, Paolillo, Sara, Rassoul, Nouredine, Kotowska, Bogumila Kutrzeba, Blanco, Victor, Adelmann, Christoph, Lazzarino, Frederic, Ercken, Monique, Murdoch, Gayle, Bommels, Jurgen, Wilson, ChristoYear:
2018
Language:
english
DOI:
10.1109/IITC.2018.8454841
File:
PDF, 1.94 MB
english, 2018