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Study of aluminium oxide thin films deposited by plasma-enhanced atomic layer deposition from tri-methyl-aluminium and dioxygen precursors: Investigation of interfacial and structural properties
Lale, A., Scheid, E., Cristiano, F., Datas, L., Reig, B., Launay, J., Temple-Boyer, PierreLanguage:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2018.09.028
Date:
September, 2018
File:
PDF, 1.70 MB
english, 2018