Critical-point model dielectric function analysis of WO 3 thin films deposited by atomic layer deposition techniques
Kılıç, Ufuk, Sekora, Derek, Mock, Alyssa, Korlacki, Rafał, Valloppilly, Shah, Echeverría, Elena M., Ianno, Natale, Schubert, Eva, Schubert, MathiasVolume:
124
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.5038746
Date:
September, 2018
File:
PDF, 1.54 MB
english, 2018