Chemical Vapor Deposition of Ru and RuO2 for Gate Electrode...

MRS Proceedings 2002 Vol. 716

Chemical Vapor Deposition of Ru and RuO2 for Gate Electrode Applications

Papadatos, Filippos, Skordas, Spyridon, Patel, Zubin, Consiglio, Steven, Eisenbraun, Eric
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Volume:
716
Year:
2002
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-716-B2.4
File:
PDF, 102 KB
english, 2002
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