A look underneath the SiO 2...

Beilstein Journal of Nanotechnology 2013 / 04 Vol. 4

A look underneath the SiO 2 /4H-SiC interface after N 2 O thermal treatments

Fiorenza, Patrick, Giannazzo, Filippo, Swanson, Lukas K, Frazzetto, Alessia, Lorenti, Simona, Alessandrino, Mario S, Roccaforte, Fabrizio
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Volume:
4
Language:
english
Journal:
Beilstein Journal of Nanotechnology
DOI:
10.3762/bjnano.4.26
Date:
April, 2013
File:
PDF, 1.03 MB
english, 2013
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