Si/Ge intermixing during Ge Stranski–Krastanov growth
Portavoce, Alain, Hoummada, Khalid, Ronda, Antoine, Mangelinck, Dominique, Berbezier, IsabelleVolume:
5
Language:
english
Journal:
Beilstein Journal of Nanotechnology
DOI:
10.3762/bjnano.5.246
Date:
December, 2014
File:
PDF, 1.96 MB
english, 2014