Technological Features of the Thick Tin Film Deposition by...

Key Engineering Materials 2018 / 9 Vol. 781

Technological Features of the Thick Tin Film Deposition by with Magnetron Sputtering Form Liquid-Phase Target

Makarova, Mariya, Moiseev, Konstantin, Nazarenko, Alexander, Luchnikov, Petr, Dalskaya, Galina, Katakhova, Natalya
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Volume:
781
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.781.8
Date:
September, 2018
File:
PDF, 1.03 MB
english, 2018
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