Impact of varying carbon concentration in SiC S/D asymmetric dual-k spacer for high performance and reliable FinFET
Gopal, Maisagalla, Awadhiya, Atul, Yadav, Nandakishor, Vishvakarma, S. K., Neema, VaibhavVolume:
39
Language:
english
Journal:
Journal of Semiconductors
DOI:
10.1088/1674-4926/39/10/104001
Date:
October, 2018
File:
PDF, 949 KB
english, 2018