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SONOS-Type Flash Memory with HfO2 Thinner than 4nm as Trapping Layer Using Atomic Layer Deposition
OH, Jae Sub, CHOI, Kwang Il, KIM, Young Su, KANG, Min Ho, SONG, Myeong Ho, LIM, Sung Kyu, YOO, Dong Eun, PARK, Jeong Gyu, LEE, Hi Deok, LEE, Ga WonVolume:
E93-C
Year:
2010
Language:
english
Journal:
IEICE Transactions on Electronics
DOI:
10.1587/transele.e93.c.590
File:
PDF, 1.95 MB
english, 2010