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Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O 2 Plasma
Mameli, Alfredo, Verheijen, Marcel A., Mackus, Adriaan J.M., Kessels, Wilhelmus M.M., Roozeboom, FredLanguage:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.8b12767
Date:
October, 2018
File:
PDF, 5.04 MB
english, 2018