![](/img/cover-not-exists.png)
Close-Spaced Vapor Transport Reactor for III-V Growth Using HCl as the Transport Agent
Funch, Christopher J., Greenaway, Ann L., Boucher, Jason W., Weiss, Robert, Welsh, Alex, Aloni, Shaul, Boettcher, Shannon W.Language:
english
Journal:
Journal of Crystal Growth
DOI:
10.1016/j.jcrysgro.2018.10.031
Date:
October, 2018
File:
PDF, 1.26 MB
english, 2018