(Invited) Advanced Replacement High-K/Metal...

ECS Transactions 2018 / 07 Vol. 86; Iss. 7

(Invited) Advanced Replacement High-K/Metal Gate Stack Engineering for High-Performance Strained Silicon-Germanium FinFETs with High Ge Content

Hashemi, Pouya, Ando, Takashi, Cartier, Eduard A., Bruley, John, Lee, Choong-Hyun, Narayanan, Vijay
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Volume:
86
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/08607.0051ecst
Date:
July, 2018
File:
PDF, 446 KB
english, 2018
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