Numerical Verification of Gallium Nitride Thin-Film Growth in a Large MOCVD Reactor
Hu, Chih-Kai, Chen, Chun-Jung, Wei, Ta-Chin, Li, Tomi T., Huang, Chih-Yung, Chao, Chu-Li, Lin, Yi-JiunVolume:
7
Language:
english
Journal:
Coatings
DOI:
10.3390/coatings7080112
Date:
July, 2017
File:
PDF, 1.88 MB
english, 2017