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Reduction of isotropic etch for silicon nanowires created by metal assisted deep reactive ion etching
Bui, Tung Thanh, Dang, Chien MauVolume:
15
Year:
2018
Language:
english
Journal:
International Journal of Nanotechnology
DOI:
10.1504/IJNT.2018.089562
File:
PDF, 3.26 MB
english, 2018