Reduction of isotropic etch for silicon nanowires created...

Reduction of isotropic etch for silicon nanowires created by metal assisted deep reactive ion etching

Bui, Tung Thanh, Dang, Chien Mau
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
15
Year:
2018
Language:
english
Journal:
International Journal of Nanotechnology
DOI:
10.1504/IJNT.2018.089562
File:
PDF, 3.26 MB
english, 2018
Conversion to is in progress
Conversion to is failed