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Fabrication of Y Doped HfO2 Epitaxial Films Directly on (001) Si Substrate; (001) Si基板直上へのY doped HfO2薄膜のエピタキシャル成長;
KAMADA, Daiki, TAKADA, Kenshi, YOSHIMURA, Takeshi, FUJIMURA, NorifumiVolume:
67
Journal:
Journal of the Society of Materials Science, Japan
DOI:
10.2472/jsms.67.848
Date:
September, 2018
File:
PDF, 643 KB
2018