Etching of low-k materials in high density fluorocarbon...

The European Physical Journal Applied Physics 2004 / 12 Vol. 28; Iss. 3

Etching of low-k materials in high density fluorocarbon plasma

Eon, D., Raballand, V., Cartry, G., Peignon-Fernandez, M.-C., Cardinaud, Ch.
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Volume:
28
Language:
english
Journal:
The European Physical Journal Applied Physics
DOI:
10.1051/epjap:2004195
Date:
December, 2004
File:
PDF, 701 KB
english, 2004
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