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Development of Localized Plasma Etching System for Failure Analyses in Semiconductor Devices: (3)Etching-Monitoring Using Quadrupole Mass Spectrometry
TAKAHASHI, Satoshi, HORIE, Tomoyuki, SHIRAYAMA, Yuya, YOKOSUKA, Shuntaro, KASHIMURA, Kenta, HAYASHI, Akihiro, IWASE, Chikatsu, SHIMBORI, Shun'ichiro, TOKUMOTO, Hiroshi, NAITOH, Yasuhisa, SHIMIZU, TetsVolume:
55
Year:
2012
Journal:
Journal of the Vacuum Society of Japan
DOI:
10.3131/jvsj2.55.171
File:
PDF, 591 KB
2012