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(Invited) HfO 2 /Al 2 O 3 Nanolaminate on Si 0.7 Ge 0.3 (100) Surface by Thermal Atomic Layer Deposition
Kwak, Iljo, Sardashti, Kasra, Clemons, Maximilian S., Ueda, Scott T, Fruhberger, Bernd, Oktyabrsky, Serge, Kummel, Andrew CVolume:
86
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/08607.0281ecst
Date:
July, 2018
File:
PDF, 2.43 MB
english, 2018