Effect of Chelating Agent and Surfactant on TaN CMP in...

ECS Journal of Solid State Science and Technology 2018 Vol. 7; Iss. 11

Effect of Chelating Agent and Surfactant on TaN CMP in Weakly Alkaline Slurry

Xiao, Yue, Pan, Guofeng, Tian, Qiyuan, He, Ping, Wang, Qingwei, Zheng, Jie, Wang, Chenwei
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
7
Year:
2018
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0071811jss
File:
PDF, 910 KB
english, 2018
Conversion to is in progress
Conversion to is failed