[IEEE 2018 40th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD) - Reno, NV, USA (2018.9.23-2018.9.28)] 2018 40th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD) - EOS/ESD in IC Manufacturing Process of GQFN 64L Devices
Chin, Bernard, Koh, L.H.Year:
2018
Language:
english
DOI:
10.23919/EOS/ESD.2018.8509770
File:
PDF, 1.43 MB
english, 2018