Run-to-run control of PECVD systems: Application to a...

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AIChE Journal 2018 / 10

Run-to-run control of PECVD systems: Application to a multiscale three-dimensional CFD model of silicon thin film deposition

Crose, Marquis, Zhang, Weiqi, Tran, Anh, Christofides, Panagiotis D.
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Language:
english
Journal:
AIChE Journal
DOI:
10.1002/aic.16400
Date:
October, 2018
File:
PDF, 767 KB
english, 2018
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