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Role of ion energy flux on the structural and morphological properties of silicon oxy-nitride composite films deposited by plasma focus device
Khan, Ijaz Ahmad, Hussain, Syed Anwaar, Farid, Amjad, Hussnain, Ali, Umar, Zeshan Adeel, Rawat, Rajdeep Singh, Ahmad, RiazLanguage:
english
Journal:
Radiation Effects and Defects in Solids
DOI:
10.1080/10420150.2018.1512999
Date:
September, 2018
File:
PDF, 2.59 MB
english, 2018