Treatment of graphene films in the early and late afterglows of N2 plasmas: comparison of the defect generation and N-incorporation dynamics
Robert Bigras, Germain, Glad, Xavier, Martel, Richard, Sarkissian, Andranik, Stafford, LucLanguage:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/1361-6595/aaedfd
Date:
November, 2018
File:
PDF, 1.72 MB
english, 2018