Crystal Growth of Low-Temperature Processed Poly-Si by...

Shinku 2000 Vol. 43; Iss. 12

Crystal Growth of Low-Temperature Processed Poly-Si by Excimer Laser Annealing. Dependences of Poly-Si Grain on Energy Density and Shot Number.

MATSUO, Naoto, ABE, Hisashi, KAWAMOTO, Naoya, TAGUCHI, Ryouhei, NOUDA, Tomoyuki, HAMADA, Hiroki, MIYOSHI, Tadaki
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Volume:
43
Year:
2000
Language:
english
Journal:
SHINKU
DOI:
10.3131/jvsj.43.1120
File:
PDF, 2.18 MB
english, 2000
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