Chemical pressure in the correlated narrow-gap...

Journal of Materials Science 2019 / 2 Vol. 54; Iss. 3

Chemical pressure in the correlated narrow-gap semiconductor FeGa3

Verchenko, Valeriy Yu., Zubtsovskii, Alexander O., Tsirlin, Alexander A., Shevelkov, Andrei V.
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Volume:
54
Language:
english
Journal:
Journal of Materials Science
DOI:
10.1007/s10853-018-3012-y
Date:
February, 2019
File:
PDF, 1.35 MB
english, 2019
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