Gradient-based Source Mask Optimization for Extreme Ultraviolet Lithography
Ma, Xu, Wang, Zhiqiang, Chen, Xuanbo, Li, Yanqiu, Arce, GonzaloYear:
2018
Language:
english
Journal:
IEEE Transactions on Computational Imaging
DOI:
10.1109/TCI.2018.2880342
File:
PDF, 2.33 MB
english, 2018